The Global ALD Equipment Market will Hit $6.5 Billion by 2028, at a CAGR of 8.3%

30-Sep-2022 | Report Format: Electronic (PDF)

ALD Equipment Market Growth, Trends and Report Highlights

According to a new report, published by KBV research, The Global ALD Equipment Market size is expected to reach $6.5 billion by 2028, rising at a market growth of 8.3% CAGR during the forecast period.

The Plasma-enhanced market acquired the highest revenue share in the Global ALD Equipment Market by Deposition Method in 2021, thereby, achieving a market value of $2.1 billion by 2028. Opportunities for the deployment of ALD are anticipated to arise because of the increasing demand for memory and logic devices across a range of applications. The thin film encapsulation of wafer processing and OLED displays for the production of logic and memory devices are excellent applications for plasma-enhanced ALD.

The Oxide Films market is showcasing a CAGR of 7.6 % during the forecast period. The rising need for high permittivity gate oxides is a significant driver boosting the market for oxide films. One of the main semiconductor applications of ALD is the deposition of high permittivity, or high-k, oxides, such as Al2O3, ZrO2, and HfO2.

The Non-semiconductor market has shown the growth rate of 8.9% during (2022 - 2028). These precursors are used to produce thin metallic films. Due to its applicability in non-semiconductor domains, there have been significant advancements in the field of ALD. In addition to providing thickness control at the Angstrom level, ALD provides excellent conformality of deposition in structures with large aspect ratios.

The Asia Pacific market dominated the Global ALD Equipment Market by Region in 2021, and would continue to be a dominant market till 2028; thereby, achieving a market value of $2.5 billion by 2028. The Europe market is witnessing a CAGR of 7.8% during (2022 - 2028). Additionally, The North America market would generate a CAGR of 7.6% during (2022 - 2028).

Full Report: https://www.kbvresearch.com/ald-equipment-market/

The market research report has exhaustive quantitative insights providing a clear picture of the market potential in various segments across the globe with country wise analysis in each discussed region. The key impacting factors of the market have been discussed in the report with the elaborated company profiles of Applied Materials, Inc., ASM International N.V., Tokyo Electron Ltd., Lam Research Corporation, Kurt J. Lesker, Veeco Instruments Inc., Optorun Co., Ltd., CVD Equipment Corporation, Eugene Technology Co. Ltd., and Beneq Oy.

Global ALD Equipment Market Segmentation

By Deposition Method

  • Plasma-enhanced
  • Thermal
  • Spatial
  • Roll-to-Roll & Powder
  • Others

By Film Type

  • Oxide Films
  • Metal Films
  • Sulfide Films
  • Nitride Films
  • Fluoride Films

By Application

  • Semiconductor
    • More Moore
    • Research & Development Facilities
    • More-than Moore
  • Non-semiconductor
    • Energy
    • Medical
    • Conventional Optics
    • Coating

By Geography

  • North America
    • US
    • Canada
    • Mexico
    • Rest of North America
  • Europe
    • Germany
    • UK
    • France
    • Russia
    • Spain
    • Italy
    • Rest of Europe
  • Asia Pacific
    • China
    • Japan
    • India
    • South Korea
    • Singapore
    • Malaysia
    • Rest of Asia Pacific
  • LAMEA
    • Brazil
    • Argentina
    • UAE
    • Saudi Arabia
    • South Africa
    • Nigeria
    • Rest of LAMEA

Companies Profiled

  • Applied Materials, Inc.
  • ASM International N.V.
  • Tokyo Electron Ltd.
  • Lam Research Corporation
  • Kurt J. Lesker
  • Veeco Instruments Inc.
  • Optorun Co., Ltd.
  • CVD Equipment Corporation
  • Eugene Technology Co. Ltd.
  • Beneq Oy

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