The North America Extreme Ultraviolet Lithography (EUVL) Systems Market would witness market growth of 20.6% CAGR during the forecast period (2022-2028).
Over the multilayer, a tantalum-based absorbent layer defines the pattern. A small layer of ruthenium may serve as protection for the multilayer. There is a significant number of market players prevailing as well as entering the industry. In mask-less lithography, a blank photomask is coated with a photoresist, which is subsequently baked (solidified) in an oven and later exposed to laser light. The unprotected portions are etched, and the exposed photoresist is produced.
After then, the remaining photoresist is eliminated. Then, using an electron beam, masks are examined and fixed. Etching is more challenging than traditional photomask manufacturing because it must be done to a very precise depth. The tool consists of a multilayer mirror-based reflecting optics system, a laser-driven tin plasma light source, and a hydrogen gas environment. The hydrogen is utilized to prevent Sn deposition on the EUV collector mirror inside the source.
The United States comprises a very robust manufacturing industry. The manufacturing sector of the country is one of the leading industries and contributes a significant proportion of the overall GDP of the country. According to the United States Department of Commerce’s National Institute of Standards and Technology, the manufacturing industry contributed $2269.2 to the United States GDP in 2020 or 10.8% of the total GDP. Manufacturing provided an estimated 24% of GDP when direct and indirect value-added (i.e., purchases from other sectors) are considered.
The US market dominated the North America Extreme Ultraviolet Lithography (EUVL) Systems Market by Country in 2021, and would continue to be a dominant market till 2028; thereby, achieving a market value of $4,812.5 Million by 2028. The Canada market is poised to grow at a CAGR of 23.3% during (2022 - 2028). Additionally, The Mexico market would witness a CAGR of 22.2% during (2022 - 2028).
Based on Equipment, the market is segmented into Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks, and Others. The report also covers geographical segmentation of Extreme Ultraviolet Lithography (EUVL) Systems market. Based on countries, the market is segmented into U.S., Mexico, Canada, and Rest of North America.
Free Valuable Insights: The Global Extreme Ultraviolet Lithography (EUVL) Systems Market is Predict to reach $23.05 Billion by 2028, at a CAGR of 21.3%
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).
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